Center for Tribology Research

Published Papers - CMP

Bench Top Dual Mode eCMP Polisher with Multi Sensing Technology

2008 CMP-MIC Conference, March 2008

Vishal Khosla, Michael Vinogradov
Center for Tribology, Campbell, CA 95008


Post-CMP Cleaning Applications: Challenges and Opportunities

2008 CMP-MIC Conference, March 2008

R.K. Singh, D.W. Stockbower and C.R. Wargo
Entegris, Inc.

V. Khosla, M. Vinogradov and N.V. Gitis
Center for Tribology, Campbell, CA 95008


Standardized Functional Tests of Pad Conditioners

Proceedings, 11th International CMP-MIC, Fremont, February 21-23, 2006

Vishal Khosla, Norm Gitis, Suresh Kuiry, Michael Vinogradov


Studies of Advanced Pad Conditioners

Proceedings, 11th International CMP-MIC, Fremont, February 21-23, 2006

Dr. James Chien-Min Sung, Dr. Norm Gitis, Vishal Khosla, Eiichi Nishizawa, Toshio Toganoh


Effect of Temperature on Pad Conditioning Process During Chemical-Mechanical Planarization

Proceedings, 11-th International CMP-MIC, Fremont, February 21-23, 2006

Subrahmanya Mudhivarth, Dr. Norm Gitis, Suresh Kuiry, Michael Vinogradov, Ashok Kumar


Effects of Slurry Flow Rate and Pad Conditioning Temperature on Dishing, Erosion and Metal Loss Copper CMP Process (PDF)

Proceeding of 22nd International VMIC Conference, October 2005

Norm Gitis, Michael Vinogradov, Suresh Kuiry
Center for Tribology, 1715 Dell Ave, Campbell, CA 95008, USA

S. Raghu Mudhivarthi, Ashok Kumar
University of Florida, Tampa, FL 33620 www.eng.usf.edu


Effects of Slurry Flow Rate and Pad Conditioning Temperature on Dishing, Erosion and Metal Loss Copper CMP (PDF)

Northern California Chapter AVS User Group Annual Symposia, Abstract Book, CMP, October 2005

Norm Gitis, Michael Vinogradov, Suresh Kuiry
Center for Tribology, 1715 Dell Ave, Campbell, CA 95008, USA

S. Raghu Mudhivarthi, Ashok Kumar
University of Florida, Tampa, FL 33620 www.eng.usf.edu


CMP Consumables Characterization (PDF)

Proceeding of 10th CMP-MIC Conference, February 2005

Norm Gitis, Michael Vinogradov, Suresh Kuiry
Center for Tribology, 1715 Dell Ave, Campbell, CA 95008, USA  


Novel Low-Abrasive Slurries And Abrasive-free solutions for copper cMP (PDF)

Proceeding of 10th CMP-MICConference, February 2005

Irina Belov, Joo-Yun Kim, Timothy Moser, Keith Pierce
Praxair Electronics, Indianapolis, IN, USA  


Advanced Specification and Tests of CMP Retaining Rings  (PDF)

Proceeding of 9th CMP-MIC Conference, February 2004

Norm V. Gitis, Jun Xiao
Center for Tribology, Inc., Campbell CA 95008

Ashok Kumar
University of South Florida, Tampa, FL 33620

Arun K. Sikder
University of South Florida and Center for Tribology, Inc.


Incoming Inspection and Failure Analysis of CMP Consumables at the Semiconductor Fab    (PDF)

Proceeding of 20th VMIC Conference, September 2003  

Michael Vinogradov and Norm V. Gitis
Center for Tribology (CETR), Inc., Campbell CA 95008


Next-Generation Materials for CMP Retaining Rings  (PDF) 

 

Rima Moussa, Carmin Quartapella,
Greene, Tweed & Co.

Tribology Issues in CMP (PDF)

Semiconductor FABTECH -18th Edition 

N.V. Gitis
Center for Tribology (CETR), Inc. , Campbell CA 95008


Study of slurry selectivity and end point detections in Cu- CMP process

Proceedings of the Eighth International CMP-MIC Conference, 

February 19-21 2003, Marina Del Rey, CA  

P. B. Zantye, A. K. Sikder, N. Gulati, and Ashok Kumar
Center for Microelectronics Research, University of South Florida


Delamination studies in Cu-ultra low-k stack

Proceedings of the Eighth International CMP-MIC Conference, 

February 19-21 2003,Marina Del Rey, CA

A. K. Sikder1, P. Zantye, S. Thagella1, Ashok Kumar
Center for Microelectronics Research, University of South Florida

B. Michael Vinogradov and Norm V. Gitis
Center for Tribology (CETR), Inc., Campbell CA 95008


Characterizing CMP pad conditioning using diamond abrasives  (PDF)

Wet Surface Technology

 

Timothy Dyer
Cymer (formerly of SpeedFam-IPEC)

Jim Schlueter
SpeedFam-IPEC


Optimization of tribological properties of silicon dioxide during the chemical mechanical planarization process

Journal of ELECTRONIC MATERIALS, Vol.30,No.12,2001

A.K. Sikder, Frank Giglio, John Wood, Ashok Kumar, and Mark Anthony
University of South Florida.


Quantitative Evaluation of CMP Process and Materials Using a CMP Tester with Multiple Sensors

Proceedings of the Second International Conference on Microelectronics and Interfaces (ICMI), February 2001, Santa Clara, CA

Dr. Norm Gitis and Michael Vinogradov
Center for Tribology, Inc., Campbell CA 95008